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Nicolet Almega-Si Wafer Sampling Stage
Not all defects and particles in semiconductor manufacturing are elemental in nature. SEM/EDS and other e-beam defect review tools are not very efficient at identifying polyester fibers, acrylic resins or human proteins. What do you do when your defect is a complex compound made up primarily of carbon?At Thermo Scientific, we have equipped our leading Raman microspectroscopy system with wafer-based stage automation and defect review software that enables you to get results when the usual e-beam and surface morphology tools aren't effective.
Based on Thermo's versatile Almega XR dispersive Raman spectrometer, this instrument uses a non-contact, non-destructive analysis technique that provides molecular-level information for a variety of analytical chemistry and material science studies.

The Almega-Si is equipped with a large format microanalysis station for handling silicon wafers and other large-area samples. The tool supports applications in semiconductor manufacturing support facilities, semiconductor R&D laboratories, and related industries.Shorter wavelength lasers (blue or green) allow more efficient analysis of small particles and defects that are frequently less than one micron in size.

Applications: • Molecular-based defect and particle analysis • Dielectrics characterization  • Thin film chemistry  • Process characterization  • Carbon analysis

The Almega-Si includes:Microscope Wafer Stage• 200 mm and 300 mm wafer handling capabilities• Zero backlash, micron level precision• Movement integrated with video

Defect Review Software• Confidently navigate to known locations• Read KLA-Tencor defect file formats