The ECO software can be used for the following standard applications:

   • Dopant concentration levels in dielectric films (BPSG, PSG, FSG, etc.)   • Hydrogen levels in Silicon Nitride films   • Epitaxial film thickness   • MEMS device thickness   • Substitutional Carbon and interstitial Oxygen levels in Silicon wafers

While the ECO software is most commonly used for these standardapplications, it can also be used for a wide range of custom applications.

The ECO software provides an easy-to-use and easy-to-learn interface for operators and a secure method development platform for process engineers and developers.

Some of the highlights of the software include:

   • Designed for touchscreen displays   • Provides positive visual and audio feedback on actions   • Password protected method development area and password protected methods   • Supports measurement options from single point measurements to complete wafer mapping options   • Support of both ASTM and JEIDA standards for measurement of substitutional Carbon and interstitial Oxygen   • Support of interferogram subtract and Cepstrum thickness measurement algorithms   • Powerful FT-IR software toolkit for custom recipe development   • Complete calibration diagnostic tools   • Wide variety of powerful quantitative algorithms supporting:       - linear regression       - multiple linear regression (MLR)       - classical least squares (CLS)       - principle component regression (PCR)       - partial least squares (PLS)   • Multiple algorithms for variable pathlength compensation   • Atmospheric water vapor interference correction   • Calibration biasing function for matching results to calibrations derived from other tools or wet methods   • Operates on Windows NT platform

The ECO software maintains Thermo Fisher Scientific's commitment to offering the most expertise and the best possible tools for FT-IR metrology.