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产品类别- 微区分析和成像 >>表面分析 >>Full Wafer XPS >>
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Theta 300工业型平行角分辨XPS微探针(ARXPS)
Theta 300 for the analyzes 300 mm wafers, combining ease of use with revolutionary analytical capability for XPS and ARXPS for thin film analysis
High Performance Spectrometer for XPS and ARXPS
  • 300 mm and 200 mm wafer handling as standard              
  • Uncompromised small sample handling              
  • Ease of use combined with revolutionary analytical capability for XPS and ARXPS              
  • Full wafer XPS and ARXPS              
  • High throughput              
  • Multiple wafer handling              
  • Full automation              
  • Windows NT based Avantage data system              
  • Designed for a multi-user environment              
  • Non-destructive ultra-thin film analysis 

    For the characterisation of ultra-thin films on wafers up to 300 mm in diameter.Theta 300 provides the solutions to the following analytical requirements:

  • Measurement of the composition, uniformity and thickness of ultra-thin films 
  • Rapid identification of sample features on the surface of a sample, providing both elemental and chemical state information 
  • Mapping the distribution of chemical states at the surface
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  • Theta 300 Literature Request